Xuzhou Bokang
China's only company engaged in EUV photoresist R&D, with a complete lineup in ArF and KrF photoresists.
Its first-mover position in EUV photoresist R&D is unique in China—although mass production is still distant, there are almost no domestic competitors in the EUV photoresist arena, the most advanced track.
Company Overview
Founded in 2010 and headquartered in Xuzhou, Jiangsu Province, Xuzhou Bokang is one of the few domestic companies that has achieved full-chain self-developed photoresist capability, from monomers to finished photoresists. The company is currently unlisted.
Xuzhou Bokang is best known for its first-mover position in the domestic R&D of EUV photoresist. EUV photoresist is the most advanced technology in the semiconductor materials field, and currently only a handful of companies worldwide, such as Japan's JSR and Tokyo Ohka, can mass-produce it. Xuzhou Bokang is the only domestic company to publicly claim ongoing EUV photoresist R&D.
Core Business
EUV Photoresist (Under Development)
As China's only company with an EUV photoresist program, it has attracted significant attention and support in the context of national policy and domestic substitution, despite the distance to commercial mass production.
ArF / KrF Photoresist
In the ArF and KrF photoresist segments, Xuzhou Bokang also maintains a complete product R&D pipeline.
Photoresist Monomer Raw Materials
The company develops its own upstream photoresist raw materials (monomers, resins, etc.) and is one of the few domestic companies capable of synthesizing photoresist raw materials.
Risks and Summary
Xuzhou Bokang is the most "technologically ambitious" company in China's photoresist field—directly taking on the most advanced EUV photoresist. However, the technical barriers for EUV photoresist are extremely high, and it may take 5–10 years from R&D to mass production.